Open Procedure For The Awarding Of The Supply And Installation Of An Atomic Layer Deposition (ald) System In Thermal Version, Intended For The Growth Of Oxides, Nitrides, And Metal Derivatives On Silicon Substrates And Other Compatible Materials, Using Th
TK ID 523263481
Document Type
Tender Notice
Tender Summary
Open Procedure For The Awarding Of The Supply And Installation Of An Atomic Layer Deposition (ald) System In Thermal Version, Intended For The Growth Of Oxides, Nitrides, And Metal Derivatives On Silicon Substrates And Other Compatible Materials, Using Th